Coater/developer (CSX2000 series)
CSX2000 series coater and developer has flexibility and scalability to accomodate a wide range of needs for research and development and mass production line.
High-quality process unit is prepared especially for a thick-film process.
For equipment configuration, we adopted a cluster system allowing selection and configuration of individual processing units necessary for required depositing process, and prescribed process capacity.
Features
- CSX2000 series is a process unit which can accomodate 150mm-200mm wafers by cassette to cassette, and which enables automatic film formation and development. (Size and layout varies)
- Free layout design can accommodate a various processes and spaces requirement.
- Coater
- Configurable with various coaters; from a general coater which combines spin-coater and bake plate to a special coater which combines rotary cup unit and spinless coat unit. Configurable for several um to 100um film thickness formations.
- Developer
- High speed developer unit is prepared for a develpment process. Process a long-time-development of thick film resist at high speed. (1/2-1/3 compared to former unit).
- GUI screen reallizes a superior operability. Easily edit complicated recipe. System configuration, which considers from research and development to mass production line, improves functionality.
Specifications
| Applied Work | 150mm to 200mm wafer |
|---|---|
| Control system | Total control by disktop PC system |
| Power source | 3φ, AC200V, 50/60Hz |
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