Coater/developer (CSX2000 series)

CSX2000 series coater and developer has flexibility and scalability to accomodate a wide range of needs for research and development and mass production line.
High-quality process unit is prepared especially for a thick-film process.
For equipment configuration, we adopted a cluster system allowing selection and configuration of individual processing units necessary for required depositing process, and prescribed process capacity.


Features

  • CSX2000 series is a process unit which can accomodate 150mm-200mm wafers by cassette to cassette, and which enables automatic film formation and development. (Size and layout varies)
  • Free layout design can accommodate a various processes and spaces requirement.
  • Coater
  • Configurable with various coaters; from a general coater which combines spin-coater and bake plate to a special coater which combines rotary cup unit and spinless coat unit. Configurable for several um to 100um film thickness formations.
  • Developer
  • High speed developer unit is prepared for a develpment process. Process a long-time-development of thick film resist at high speed. (1/2-1/3 compared to former unit).
  • GUI screen reallizes a superior operability. Easily edit complicated recipe. System configuration, which considers from research and development to mass production line, improves functionality.

 

Specifications

Applied Work 150mm to 200mm wafer
Control system Total control by disktop PC system
Power source 3φ, AC200V, 50/60Hz

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