PSYRION®
Hot Phosphoric acid used for the silicon nitride film etching needs to be constantly replaced with fresh chemical as the silicon concentration increases by the etching process. Our original technology removes the dissolved silicon and enables reclaim and reuse of Phosphoric Acid. PSYRION® has sufficient install base at leading semiconductor manufacturers and contributes to reduction of chemical cost and environment protection.
Features
・Reduces cost of purchasing Phosphoric Acid dramatically
・Reduces Amount of Phosphoric Acid waste and contributes environment protection
・No limitation for the number of times of repeat
・Multiple wet stations / process bathes can be plumbed to one PSYRION
・Any wet stations can be connected regardless of manufacturer or model
・Automatic flushing function
・Various options are available
Specifications
Contact us for questions about products.
